개인정보처리방침

02841
서울시 성북구 안암동 안암5가
고려대학교자연계 캠퍼스
공학관 204호(Prof.), 공학관 241호
(연구실)
대표전화 : 02.3290.3237(Prof.),
3671(연구실)

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SCI Journal

번호 제목 Journal
196 Fabrication of diamondlike carbon-coated field emitter triode using aluminum parting layer J.Vac.Sci.Tech. vol. B16, pp. 1203-1206, 1998. 5/6. 
195 Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing cycle J.SID, vol. 7, pp. 245-248, 1999. 
194 Improvement of field emission properties by formation of Nb-silicide layer on silicon-tip FEAs J.SID vol. 7, pp. 576-579, 1999. 05 
193 Effects of a hydrophilic surface in anodic bonding J.Micromechanics and Microengineering, vol. 9, pp. 313-318, 1999. 09. 
192 Experimental analysis on the anodic bonding with an evaporated glass layer J.Micromech.Microeng, vol. 7, pp. 316-322,1997. 
191 Silicon-to-indium tin oxide coated glass bonding for packaging of field emission arrays fabricated on silicon wafer J.Materials Science, vol. 34, pp. 4711-4717, 1999. 10. 
190 Interfacial oxide growth and filling-up behaviour of the micro-gap in silicon fusion bonding processes J.Materials Science, vol. 28, pp. 1168-1174, 1993. 
189 Fabrication of silicon membrane using fusion bonding and two-step electrochemicaletch-stopping J.Materials Science, 1994. 
188 Structure and Morphology of Vacuum-Evaporated Pentacene as a Function of the Substrate Temperature J.Korean Physical Society, vol. 42, pp. S647-S651, 2003. 02 
187 Observation of Field-Induced Electron Emission in Porous Polycrystalline Silicon Nano-Structured Diode J.Korean Physical Society, vol. 42, pp. S179-S183, 2003. 02. 
186 Substrate temperature effect on the formation of PtRhOx thin films J.Korean Physical Society, vol. 41, pp. 745-748, 2002. 11. 
185 Effects of substrate temperature on etched feature of chromium film and its application to field emitter arrays(FEAS) J.Korean Physical Society, vol. 39, pp. S101-S107, 2001. 12. 
184 Effect of Oxygen Plasma Treatment on Anodic Bonding J.Korean Physical Society, vol. 38, pp. 207-209, 2001. 03. 
183 Effects of phosphorus doping level and excess silicon on the oxidation of tungsten polycide J.Korean Physical Society, vol. 29, pp. 658-663,1996. 10. 
182 Fabrication of Diodes Using the Si-iBP-Si SOI Structure J.Korean Physical Society, vol. 20, pp. 373-378, 1987. 12. 
181 Electrostatic Bonding of Silicon-to-ITO coated #7059 Glass using Li-doped Oxide Interlayer J.Kor.Phys.Soc. vol. 33, pp. S406-S410, 1998. 11. 
180 Conduction Electron Resonance and Transport Properties of a Nonaligned Carbon Nanotube Thick Film for Field Emission Display J.Electrochemical Society, vol. 147, pp. 3564-3568, 2000. 09. 
179 The Influence of Surface Roughness on the Electric Conduction Process in Amorphous Ta2O5 Thin Films J.Electrochemical Society, vol. 146, pp. 3398-3402, 1999. 09. 
178 The Analysis of Oxygen Plasma Pretreatment for Improving Anodic Bonding J.Electrochem.Soc. vol. 149, pp. G8-G11, 2002. 01. 
177 Application of Electrostatic Bonding to Field Emission Display Vacuum Packaging J.Electrochem.Soc. vol. 147, pp. 2385-2388, 2000. 06.